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Metal-Assisted Catalytic Etching (MACE) for Nanofabrication of Semiconductor Powders
2021
Micromachines
Electroless etching of semiconductors has been elevated to an advanced micromachining process by the addition of a structured metal catalyst. Patterning of the catalyst by lithographic techniques facilitated the patterning of crystalline and polycrystalline wafer substrates. Galvanic deposition of metals on semiconductors has a natural tendency to produce nanoparticles rather than flat uniform films. This characteristic makes possible the etching of wafers and particles with arbitrary shape and
doi:10.3390/mi12070776
pmid:34209231
pmcid:PMC8304928
fatcat:yripngzecjbllkfewpx62luqa4