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Smart E-Beam for Defect Identification & Analysis in the Nanoscale Technology Nodes: Technical Perspectives
2017
Electronics
Optical beam has been the veteran inspector of semiconductor wafer production house, ever since the birth of integrated circuit (IC). As technology and market place raise the bar on chip density, Moore's law stretches to the limit. Due to its inherent physical limitations, the optical method just cannot see the measuring rod of silicon industry getting recalibrated to finer nano-scales. Electron Beam Inspection (EBI), by virtue of its high resolution, has started to rule the nodes at 10 nm and
doi:10.3390/electronics6040087
fatcat:6uytwvh37bchhmeskubhvrtxuu