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High quality Al/sub 2/O/sub 3/ IPD with NH/sub 3/ surface nitridation
2003
IEEE Electron Device Letters
In this letter, the effect of surface NH 3 nitridation on the electrical properties and reliability characteristics of aluminum oxide (Al 2 O 3 ) interpoly capacitors is studied. With NH 3 surface nitridation, the formation of an additional layer with lower dielectric constant during post-annealing process can be significantly suppressed, compared to that without nitridation treatment. Furthermore, the presence of a thin Si-N layer can make postdeposition annealing more effective in eliminating
doi:10.1109/led.2003.815152
fatcat:kqbzrb7i2rdppnfwq2o7xf2wku