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Fundamental Studies of Acid-Breakable Resins for Chemical-Amplification Positive Resist Matrices

Tadashi Arai, Sonoko Migitaka, Toshio Sakamizu, Kei Kasuya, Michiaki Hashimoto, Hiroshi Shiraishi
2001 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  

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We have investigated acid-breakable (AB) resins for chemical-amplification positive resists. The AB resin was synthesized by a co-condensation reaction between an alkali-soluble polyphenol (4,4'-[l- [4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl] -ethylidene]bis phenol) and an aromatic multi-functional (tri-functional) vinylether compound. The AB resin did not dissolve in an aqueous base developer (TMAH: 2.38%), and it had a good margin for the polyphenol/vinylether feed ratio. Even for AB
more » ... with large differences in molecular weight, the AB-resin-based resist exhibited almost the same exposure characteristics. We also examined the relationship between the inhomogeneous distribution of the acid generator and the film structure of the AB-resin-based resist.
doi:10.2494/photopolymer.14.523 fatcat:pdiwzuq7yzg6rlpqsiikqbmbue
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Tadashi Arai, Sonoko Migitaka, Toshio Sakamizu, Kei Kasuya, Michiaki Hashimoto, Hiroshi Shiraishi. "Fundamental Studies of Acid-Breakable Resins for Chemical-Amplification Positive Resist Matrices." Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi) 14.4 (2001) 523-530