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Two kinds of amorphous Si1-xCx: H films have been prepared by the magnetron sputtering method, using ( I) a composite target of silicon and graphite in a gas mixture of argon and hydrogen, and ( II) a silicon target in a gas mixture of argon and methane. The dependence of the optical, structural, electrical and optoelectronic properties on the carbon content x has been investigated. In the case of ( I), although the formation of the carbon clusters results in the composition-independent featuredoi:10.3131/jvsj.29.6_251 fatcat:y7tautw3yrg6df5akxy43irsci