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Aberration-corrected optics have made electron microscopy at atomic-resolution a widespread and often essential tool for nanocharacterization. Image resolution is dominated by beam energy and the numerical aperture of the lens (α), with state-of-the-art reaching 0.47 Å at 300 keV. Two-dimensional materials are imaged at lower beam energies to avoid knock-on damage, limiting spatial resolution to 1 Å. Here, by combining a new electron microscope pixel array detector with the dynamic range toarXiv:1801.04630v1 fatcat:3o6kswfzr5bttczo6wqlb4jtqu