Comparison of patterning silicon and silicon carbide using focused ion beam

S.K.P. Veerapandian, Susanne Beuer, Maximilian Rumler, Florian Stumpf, Keith Thomas, L. Pillatsch, Johannes Michler, Lothar Frey, Mathias Rommel
2014
doi:10.24406/publica-fhg-387002 fatcat:exram5rq3rcbdajf6ld2lpgpza