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PREVAIL—Electron projection technology approach for next-generation lithography
2001
IBM Journal of Research and Development
This paper is an overview of work in the IBM Microelectronics Division to extend electronbeam lithography technology to the projection level for use in next-generation lithography. The approach being explored-Projection Reduction Exposure with Variable Axis Immersion Lenses (PREVAIL)-combines the high exposure efficiency of massively parallel pixel projection with scanning-probe-forming systems to dynamically correct for aberrations. In contrast to optical lithography systems, electron-beam
doi:10.1147/rd.455.0615
fatcat:6mwjd6woufal7d6i7hby7sriti