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Some Organic Compounds as Accelerator and Inhibitor for Electroplating Process
2013
Asian Journal of Chemistry
The electroplating of copper on copper and steel surface was studied in absence and in presence of 6(2, 4-dimethoxyphenyl)-2-oxo-1,2, 3,4-tetrahydropyrimidine-5-carbonitrile [Compound I] and calcium bis- [(R)-3-(2, 4-dihydroxy-3, 3-dimethylbutyramido) propionate] (D-calcium pantothenate) [compound II] by measuring the limiting current. It is found that, the rate of plating depends on the concentration of CuSO4, types of organic additives and its concentrations, viscosity, density and types of
doi:10.14233/ajchem.2013.14430
fatcat:zeysb3eqwbhs7mfu27iugchwbu