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The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope
Photomask Technology 2013
The SEMATECH High Numerical Aperture Actinic Reticle Review Project (SHARP) is a newly commissioned, synchrotron-based extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP offers several major advances including objective lenses with 4×NA values from 0.25 to 0.625, flexible, lossless coherence control through a Fourier-synthesis illuminator, a rotating azimuthal plane of incidence up to ±25°, illumination central ray angles from 6 to 10°, and a continuously tunable, EUVdoi:10.1117/12.2026496 fatcat:ehhpny5mhvdovg2yjh75jcizm4