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Improved Clival Gate 4H-SiC MESFET with Recessed Drain Drift Region and Recessed P-Buffer Layer
2015
Proceedings of the 2015 International Conference on Electrical, Electronics and Mechatronics
unpublished
An improved clival gate 4H-SiC MESFET with recessed drain drift region and recessed p-buffer layer (RDRP-CG MESFET) was proposed in this paper. The key improvement in this paper is the enhancement of the drain current and the breakdown voltage. The recessed drain drift region and recessed p-buffer layer are introduced in the proposed structure to ensure the rise of the drain current and the breakdown voltage simultaneously. DC and RF characteristics are simulated and compared to the clival gate
doi:10.2991/iceem-15.2015.11
fatcat:mokn4aqqkra4bna552d6fgnjku