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Energetic Considerations For Sputter Deposition Processes
Sputter deposition processes, especially for sputtering from metal targets, are well investigated. For practical reasons, i.e. for industrial processes, energetic considerations for sputter deposition are useful in order to optimize the sputtering process. In particular, for substrates at floating conditions it is required to obtain energetic conditions during film growth that enables sufficient dense metal films of good quality. The influence of ion energies, energy density and momentumdoi:10.5281/zenodo.1087272 fatcat:47mklz5qxjam5hnwor76wtauru