Measurement, separation, and amelioration of transverse scanning synchronization error

Yuji Yamaguchi, Ranjan Khurana, Adlai H. Smith, Venky Subramony, Calvin Chen Chii Wean, Joseph J. Bendik, Donis G. Flagello
2006 Optical Microlithography XIX  
The need for lithographic tool advances for reducing feature size, pitch (low k1 processing), and improving overlay stems directly from next generation circuit layout and performance roadmaps 1 . Overlay error or layer-to-layer misalignment tolerances have continued to decrease to the point where a few nanometers of misalignment can seriously impact process and device yields. In this work, we expand our previous work 2 and introduce a new scanner aberration monitoring methodology that can both
more » ... logy that can both measure and deconvolve lens distortion from scanning synchronization error while simultaneously providing machine corrections for accurate tool matching. Experimental data taken from several machines suggests it is possible to ameliorate scanning synchronization error for each machine and improve tool-to-tool matching at the level required for next generation processing. Finally, we discuss applications of this new technology including practical fab implementation and discovering problematic scanning tool signatures.
doi:10.1117/12.674471 fatcat:y3bmcfjqevcpxhmvzhx3t5vteq