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Nonmaximally entangled state quantum photolithography
2003
Journal of Optics B-Quantum and Semiclassical Optics
Many previous works on quantum photolithography are based on maximally-entangled states (MES). In this paper, we generalize the MES quantum photolithography to the case where two light beams share a N-photon nonmaximally-entangled state. we investigate the correlations between quantum entanglement and quantum photolithography. It is shown that for nonlocal entanglement between the two light beams the amplitude of the deposition rate can be changed through varying the degree of entanglement
doi:10.1088/1464-4266/5/5/005
fatcat:4sudqa5mp5bb3h2dn3nc7t4qjy