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Surface Science [Working Title]
Recently, graphene nanomaterial has drawn great interest due to its excellent electrical and optoelectrical properties. The etching of graphene based on plasma engineering to achieve atomically thin layer and extremely clean surface is a hot issue, which is highly desirable for industrial applications. The resided contaminants with high intrinsic roughness create the degradation of performance. The impurities are removed via surface cleaning method and layer-by-layer plasma etching via top-downdoi:10.5772/intechopen.92627 fatcat:xjlsej3z6jep7pgptkrr5fm4sq