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Design and Synthesis of New Alicyclic Acrylate Polymer with Androstane Moiety for 193nm Resist
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
Syntheses of new alicyclic (meth)acrylate polymers containing androstane moieties, especially cholic acid derivatives, and their characteristics were investigated for 193nm single layer resist. Among the derivatives, a deoxycholic acid structure was selected from the viewpoints of its ability for dry-etching resistance, adhesion on a substrate, and solubility for resist solvents. A work of adhesion, Ohnishi and ring parameters were used as measures for the adhesion and the dry-etchingdoi:10.2494/photopolymer.12.477 fatcat:fgifmw5jhjbh3coo6ekaunepri