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In this study, WO3–Nb2O5 electrochromic films and an ITO/WO3–Nb2O5/Nb2O5/NiVOx/ITO all-solid-state electrochromic device were deposited using fast-alternating bipolar-pulsed magnetron sputtering using tungsten and niobium targets. The influence of different sputtering powers from the niobium target on the refractive index, extinction coefficient, optical modulation, coloration efficiency, reversibility, and durability of the WO3–Nb2O5 films is discussed. The aim of this work is to find thedoi:10.3390/coatings9010009 fatcat:3p5dwfpqpvghbhhf44y3neum5i