Dispersion engineering of high-Q silicon microresonators via thermal oxidation

Wei C. Jiang, Jidong Zhang, Nicholas G. Usechak, Qiang Lin
2014 Applied Physics Letters  
We propose and demonstrate a convenient and sensitive technique for precise engineering of group-velocity dispersion in high-Q silicon microresonators. By accurately controlling the surface-oxidation thickness of silicon microdisk resonators, we are able to precisely manage the zero-dispersion wavelength while simultaneously further improving the high optical quality of our devices, with the optical Q close to a million. The demonstrated dispersion management allows us to achieve parametric
more » ... ration with precisely engineerable emission wavelengths, which shows great potential for application in integrated silicon nonlinear and quantum photonics.
doi:10.1063/1.4890986 fatcat:wv2xfyglhvdtfo6gcz5qrsiso4