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The difficulty of performing a reliable carbon NEXAFS measurement for thin films and adsorbate systems has long been recognized. The difficulty is typically related to lower S/B, carbon buildup in beamline optics, dirty mesh, presence of the high-order x-rays, etc. To alleviate the experimental difficulty, we have constructed an intensitymonitoring ion chamber situated between the beamline and sample chamber. The ion chamber is filled with argon up to a working pressure of 10 -3 Torr anddoi:10.1063/1.2644705 fatcat:vm27yypssnc4rgppcp7vp3y74u