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D-1 反応性スパッタ法による窒化アルミニウム薄膜の作製とその特性(バルク波・表面波デバイス)
D-1 Preparation and Characteristics of Aluminum Nitride Thin Films by Reactive Sputtering
Proceedings of Symposium on Ultrasonic Electronics
D-1 Preparation and Characteristics of Aluminum Nitride Thin Films by Reactive Sputtering
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