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On Liquid-Phase Deposition of Silicon Dioxide by Boric Acid Addition
1997
Journal of the Electrochemical Society
The current status of liquid-phase deposition (LPD) of Si02 by adding boric acid (H3B03) to a hydrofluosilicic acid (H2SiF6) is reviewed and compared with some new results from the authors' laboratory Large discrepancies exist in the literature concerning the effects of various processing parameters on deposition rate. We have shown that much confusion arises from the misconception of using on 5i03 additive to "saturate" and usng water to "dilute" the growth solution. In this paper the role of
doi:10.1149/1.1837547
fatcat:ic4ztnf53bf2dpssxwjrjwjgdq