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Thickness Measurement of V2O5Nanometric Thin Films Using a Portable XRF
Journal of Spectroscopy
Nanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and developed for determining the thickness of V2O5nanometric thin films deposited on the glass surface using Portable X-Ray Fluorescence (PXRF) equipment and the attenuation of the radiation intensitydoi:10.1155/2016/9509043 fatcat:7yrgrpos5ba6lhi4wt3kfilrme