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Sheet Resistance Measurement of Non-Standard Cleanroom Materials Using Suspended Greek Cross Test Structures
IEEE transactions on semiconductor manufacturing
This paper presents work on the development, fabrication and characterization of a suspended Greek cross measurement platform that can be used to determine the sheet resistance of materials that would contaminate Complementary Metal Oxide Semiconductor (CMOS) processing lines. The arms of the test structures are made of polysilicon/silicon nitride (Si 3 N 4 ) to provide a carrier for the film to be evaluated and thick aluminum (Al) probe pads for multiple probing. The film to be evaluated isdoi:10.1109/tsm.2005.863248 fatcat:qxnk2ia7qrbo5m2zoqms6cpmem