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A Comparative Analysis between Standard and mm-Wave Optimized BEOL in a Nanoscale CMOS Technology
2020
Electronics
This paper presents an extensive comparison of two 28-nm CMOS technologies, i.e., standard and mm-wave-optimized (i.e., thick metals and intermetal oxides) back-end-of-line (BEOL). The proposed comparison is carried out at both component and circuit level by means of a quantitative analysis of the actual performance improvements due to the adoption of a mm-wave-optimized BEOL. To this end, stand-alone transformer performance is first evaluated and then a complete mm-wave macroblock is
doi:10.3390/electronics9122124
fatcat:aymuwrevybfn5daux27cbjmciy