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Jet spectroscopy and excited state dynamics of SiH2 and SiD2
1992
Journal of Chemical Physics
Silylene radicals, SiH, and SiD, , are generated in a supersonic free jet by ArF laser ( 193 nm) photolysis of phenylsilane and phenylsilane-a-d, , respectively. LIF excitation and dispersed fluorescence spectra are measured for the vZ vibronic bands of the 2 'B, -2 'A, transition. The heterogeneous predissociation to Si (3P) + H, is proposed from the anomalous rotational structure in the excitation spectra; the rotational lines of the r( 1) subbranch (K : = 0 +K I= 1) have stronger intensity
doi:10.1063/1.462479
fatcat:xrg37rmhrzhi7j5hwknwflt4qu