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Single step direct-write photomask made from bimetallic Bi/In thermal resist
2003
Photon Processing in Microelectronics and Photonics II
A new single step direct-write photomask process has been proposed by using Bi/In bimetallic thermal resist which turns almost transparent with high energy laser exposure. The Bi over In metallic films, each layer ~40 nm thick, were DCsputtered onto quartz mask plate substrates in a single pump-down chamber. Before laser exposure the Bi/In had 2.91 Optical Density. Bi/In is a bimetallic thermal resist and hence shows near wavelength invariance exposure sensitivity from Near IR to UV light. For
doi:10.1117/12.479415
fatcat:7mhfxssizzcqrcfst5uuryresa