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Effects of the initial stress at the bottom of open TSVs
2015
2015 IEEE 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits
In this work we have studied delamination in Open Through Silicon Vias structures under different initial stress loads. The study has been carried out by means of simulation which is based on the evaluation of the J integral for different interfaces. Our simulations enabled us to determine the structures with the lowest failure probability.
doi:10.1109/ipfa.2015.7224429
fatcat:kryxs652hfeivbim3bwkzsy2um