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High-temperature ferroelectric domain stability in epitaxial PbZr0.2Ti0.8O3 thin films
2006
Applied Physics Letters
Using high-resolution atomic force microscopy, we have shown extremely high stability of linear ferroelectric domains in epitaxial PbZr 0.2 Ti 0.8 O 3 thin films heated up to 735°C, a significant advantage for technological applications. An elevated transition temperature ϳ785°C is observed even in relatively thick ͑91 nm͒ films, despite relaxation of in-plane film-substrate lattice-mismatch-induced strain. We also demonstrate the negligible role of the film surface in determining the written
doi:10.1063/1.2196482
fatcat:vr5f7hgmdne2lnnkcnoz556nsu