Chiral modulations and reorientation effects in MnSi thin films

E. A. Karhu, U. K. Rößler, A. N. Bogdanov, S. Kahwaji, B. J. Kirby, H. Fritzsche, M. D. Robertson, C. F. Majkrzak, T. L. Monchesky
2012 Physical Review B  
Vous avez des questions? Nous pouvons vous aider. Pour communiquer directement avec un auteur, consultez la première page de la revue dans laquelle son article a été publié afin de trouver ses coordonnées. Si vous n'arrivez pas à les repérer, communiquez avec nous à Access and use of this website and the material on it are subject to the Terms and Conditions set forth at Chiral modulations and reorientation effects in MnSi thin films
more » ... , E. A.; Roßler, U. K.; Bogdanov, A. N.; Kahwaji, S.; Kirby, B. J.; Fritzsche, H.; Robertson, M. D.; Majkrzak, C. F.; Monchesky, T. L. L'accès à ce site Web et l'utilisation de son contenu sont assujettis aux conditions présentées dans le site We present an experimental and theoretical investigation of the influence of a uniaxial magnetocrystalline anisotropy on the magnetic textures that are formed in a chiral magnetic system. We show that the epitaxially induced tensile stress in MnSi thin films grown on Si(111) creates an easy-plane uniaxial anisotropy. The magnetoelastic shear stress coefficient is derived from SQUID magnetometry measurements in combination with transmission electron microscopy and x-ray diffraction data. Density functional calculations of the magnetoelastic coefficient support the conclusion that the uniaxial anisotropy originates from the magnetoelastic coupling. Theoretical calculations based on a Dzyaloshinskii model that includes an easy-plane anisotropy predict a variety of modulations to the magnetic order that are not observed in bulk MnSi crystals. Evidence for these states is found in the magnetic hysteresis and polarized neutron reflectometry measurements.
doi:10.1103/physrevb.85.094429 fatcat:7edftukh2rd43brlu57orbi72q