Lithography simulation employing rigorous solutions to Maxwell's equations

Ronald L. Gordon, Chris A. Mack, Luc Van den Hove
1998 Optical Microlithography XI  
A method of obtaining rigorous solutions to Maxwell's equations for the transmission of light through a photomask, both chrome-based and phase-shifting, is presented. The electromagnetic simulator will predict the transmission of light through the mask taking into account material properties, width, and thickness of the structures on the mask. This electromagnetic simulation will then be incorporated into the software package PROLITHJ2 for complete simulation down to the resist level. Examples
more » ... f lithography simulation using these rigorous solutions will be presented.
doi:10.1117/12.310747 fatcat:iqcdlcl5yzd2zenjhhfnhkejki