Accurate fringe capacitance model considering RSD and metal contact for realistic FinFETs and circuit performance simulation

Kyeungkeun Choe, TaeYoon An, SoYoung Kim
2014 2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)  
In this paper, analytical gate fringe capacitance model of FinFETs including metal contact and raised source and drain (RSD) are developed. Each cross capacitance models are derived using conformal mapping and field integration. The proposed models are verified with a three-dimensional field solver, Raphael. By including the additional fringe capacitance from RSD and metal contact in BSIM-CMG platform, realistic transition frequency (fT) and propagation delay of 9-stage ring oscillators are
more » ... icted and compared with those predicted by default BSIM-CMG capacitance models.
doi:10.1109/sispad.2014.6931555 fatcat:top47dzqcnhz7irvyfo3qqzrbq