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Plasma-Enhanced Chemical Vapor Deposition: Where we are and the Outlook for the Future
[chapter]
2016
Chemical Vapor Deposition - Recent Advances and Applications in Optical, Solar Cells and Solid State Devices
Chemical vapor deposition (CVD) is a technique for the fabrication of thin films of polymeric materials, which has successfully overcome some of the issues faced by wet chemical fabrication and other deposition methods. There are many hybrid techniques, which arise from CVD and are constantly evolving in order to modify the properties of the fabricated thin films. Amongst them, plasma enhanced chemical vapor deposition (PECVD) is a technique that can extend the applicability of the method for
doi:10.5772/64654
fatcat:7dutdf3sqfda7ftfob65ifg3ly