Resist Removal Method using Xe2 Excimer Ultraviolet Light

Akihiko Kono, Yousuke Goto, Yukihiro Angata, Fumikazu Mizutani, Hideo Horibe
2011 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  
doi:10.2494/photopolymer.24.389 fatcat:2apvc6u5oneqtmfr2hvatmfhti