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Application of signal reconstruction techniques to shot count reduction in simulation driven fracturing
2011
Photomask Technology 2011
Traditionally, Variable Shape Electron Beam (VSEB) mask writing tools generate pixel-based optical proximity correction (OPC) or inverse lithography technology (ILT) masks by first simplifying them into a rectilinear polygon, and then partitioning the rectilinear polygon into shots. However, as these masks are complex and curvilinear, this approach results in an explosion of shot count and mask write time, and a loss of optimality of the OPC solution. In this work we propose an alternative
doi:10.1117/12.897051
fatcat:47iszoyl2nb7thrhnipiekvpwa