A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2017; you can also visit the original URL.
The file type is application/pdf
.
Test and Analysis of the ESD Robustness for the Diode-Connected a-IGZO Thin Film Transistors
2013
IEEE/OSA Journal of Display Technology
In this work, wafer level TLP testing is applied to amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistors (TFTs) to study the factors of their electrostatic discharge (ESD) robustness. Two kinds of TFTs with N O and O treatments are subject to the ESD test. It is found that the contact resistance of the TFTs, instead of the channel quality, dominates the ESD power for them to be damaged. Index Terms-Amorphous Indium-Gallium-Zinc Oxide thin film transistor (a-IGZO TFT), electrostatic discharge (ESD).
doi:10.1109/jdt.2013.2257680
fatcat:4lqjxqsk2bb4bnh3euxwuxki5e