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High-acoustic-impedance tantalum oxide layers for insulating acoustic reflectors
IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control
This work describes the assessment of the acoustic properties of sputtered tantalum oxide films intended for use as high-impedance films of acoustic reflectors for solidly mounted resonators operating in the gigahertz frequency range. The films are grown by sputtering a metallic tantalum target under different oxygen and argon gas mixtures, total pressures, pulsed dc powers, and substrate biases. The structural properties of the films are assessed through infrared absorption spectroscopy anddoi:10.1109/tuffc.2012.2205 pmid:22481769 fatcat:xub3ytlekvbibmmrokeogfa77y