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3D lumped parameter model for lithographic simulations

Jeff D. Byers, Mark D. Smith, Chris A. Mack, Anthony Yen
2002 Optical Microlithography XV  

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doi:10.1117/12.474490 fatcat:pjteg26gt5gh3coedjeqofpmiy
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Jeff D. Byers, Mark D. Smith, Chris A. Mack, Anthony Yen. "3D lumped parameter model for lithographic simulations." Optical Microlithography XV (2002)