On tailored three-dimensional optical materials by atomic layer deposition

Andreas Markus Frölich
Atomic Layer Deposition in combination with selective etch processes is exploited as a tool to impart tailored optical functionality to a three-dimensional polymeric nano-template made by Direct-Laser-Writing lithography. This way, tailor-doped semiconductor films and the first photonic crystal exhibiting a complete photonic bandgap in the visible are fabricated and characterized. The photonic crystal is shown to drastically modify the spontaneous emission of embedded emitters.
doi:10.5445/ir/1000035498 fatcat:zuswwzufrrbpro6q2acknn23yu