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On tailored three-dimensional optical materials by atomic layer deposition
2013
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Atomic Layer Deposition in combination with selective etch processes is exploited as a tool to impart tailored optical functionality to a three-dimensional polymeric nano-template made by Direct-Laser-Writing lithography. This way, tailor-doped semiconductor films and the first photonic crystal exhibiting a complete photonic bandgap in the visible are fabricated and characterized. The photonic crystal is shown to drastically modify the spontaneous emission of embedded emitters.
doi:10.5445/ir/1000035498
fatcat:zuswwzufrrbpro6q2acknn23yu