Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source

Takeshi Ohta, Krzysztof M. Nowak, Takashi Suganuma, Hidenobu Kameda, Masato Moriya, Toshio Yokoduka, Yasufumi Kawasuji, Junichi Fujimoto, Hakaru Mizoguchi, Patrick P. Naulleau, Obert R. Wood II
2012 Extreme Ultraviolet (EUV) Lithography III  
doi:10.1117/12.916586 fatcat:7qs3mbutvveaxobzxczuaxwdbu