Influence of Nitrogen Plasma Treatment on Low Temperature Deposited Silicon Nitride Thin Film for Flexible Display
플렉서블 디스플레이 적용을 위한 저온 실리콘 질화막의 N2플라즈마 처리 영향

Seongjong Kim, Moonkeun Kim, Kwang-Ho Kwon, Jong-Kwan Kim
2014 Journal of the Korean Institute of Electrical and Electronic Material Engineers  
Silicon nitride thin film deposited with Plasma Enhanced Chemical Vapor Deposition was treated by a nitrogen plasma generated by Inductively Coupled Plasma at room temperature. The treatment was investigated by Fourier Transform Infrared Spectroscopy and Atomic Force Microscopy on the surface at various RF source powers at two RF bias powers. The amount of hydrogen was reduced and the surface roughness of the films was decreased remarkably after the plasma treatment. In order to understand the
more » ... to understand the causes, we analyzed the plasma diagnostics by Optical Emission Spectroscopy and Double Langmuir Probe. Based on these analysis results, we show that the nitrogen plasma treatment was effective in the improving of the properties silicon nitride thin film for flexible display.
doi:10.4313/jkem.2014.27.1.39 fatcat:pci2ar3lxvflxfcs7ktfm425xi