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From 78 to 150 °K, and at coverages < 8 x 1014 molecules/cm2, the sticking probability s of nitrogen on tungsten films (= 0*9) is independent of both temperature and coverage, whereas at temperatures above 150 °K it is a function of both these variables. These results are interpreted in terms of a physically adsorbed precursor state with a heat of adsorption of ca. 3 kcal/mole. It is concluded that only a fraction of molecules colliding with the surface enter this state and that it is thisdoi:10.1098/rspa.1967.0070 fatcat:ogewymedzbcdhf3xva6ehecefe