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Neutron transmutation doping of isotopically engineered Ge
1994
Applied Physics Letters
We report a novel approach for obtaining precise control of both p-and n-type dopant concentrations in bulk Ge single crystals. High-purity Ge single crystals of controlled 74Ge/70Ge isotope composition ratios were grown and subsequently doped by the neutron transmutation doping (NTD) technique. The resulting net-impurity concentrations and the compensation ratios were precisely determined by the thermal neutron fluence and the [74Ge]/[70Ge] ratios of the starting Ge materials, respectively.
doi:10.1063/1.111703
fatcat:3chpt2qnlna5fnily73pe6tjua