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Integrated On-Chip Inductors with Magnetic Films

Donald S. Gardner, Gerhard Schrom, Peter Hazucha, Fabrice Paillet, Tanay Karnik, Shekhar Borkar, Jason Saulters, Jordan Owens, Jeff Wetzel
2006 2006 International Electron Devices Meeting  

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On-chip inductors with 2 levels of magnetic material were integrated into an advanced 130 nm CMOS process to obtain over an order of magnitude (>14×) increase in inductance and Q-factor, significantly greater than prior values of 2.3× for high frequency inductors. The magnetic material is shown to operate at frequencies beyond 6.4 GHz for 1 nH inductors. An amorphous CoZrTa alloy exhibiting high permeability, good high-temperature stability (>250°C), high saturation magnetization, low
more » ... iction, high resistivity, minimal hysteretic loss, and compatible with silicon technology was used in combination with magnetic vias and elongated structures that take advantage of the uniaxial magnetic anisotropy.
doi:10.1109/iedm.2006.347002 fatcat:riepw423mfhbzn3n53b5ynzkny
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Donald S. Gardner, Gerhard Schrom, Peter Hazucha, Fabrice Paillet, Tanay Karnik, Shekhar Borkar, Jason Saulters, Jordan Owens, Jeff Wetzel. "Integrated On-Chip Inductors with Magnetic Films." 2006 International Electron Devices Meeting (2006)