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Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of Permalloy magnetic thin films
2012
Journal of Physics, Conference Series
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We have designed and developed an indigenous ultra high vacuum (UHV) sputtering system which can deposit magnetic thin films with high purity and good uniformity. The equipment consists of state-of the-art technologies and sophistication. With this system it is possible to deposit coatings of various materials on a sample size of 3"3" 3". The Ni 81 Fe 19 ferromagnetic thin films, with Tantalum (Ta) as a buffer and cap layers have been deposited on silicon substrates using this ultra high
doi:10.1088/1742-6596/390/1/012081
fatcat:ykfy62c4mrfotmoysjodgjyulm