Block copolymers provide regular nanoscale microphase separation structures whose pattern size ranges typically several tens nanometers(meso-scales). How to control these structures and patterns is of particular importance from technological viewpoints because top-down(photolithography etc.)and bottom-up supramolecular assembly approaches typically do not reach such feature size. We introduce here our recent research activities to perform the structure and orientation controls of the

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... ns formed by block copolymer thin films. The former describes the versatility of using mediating low-molecular-mass molecule to achieve highly ordered array structure in the monolayer systems. The latter part demonstrates that how light irradiation is powerful to control them both in the monolayer and spincast film systems.