Growth of high quality nitride semiconductors by sputtering and its application to device fabrication
スパッタリング法による高品質窒化物半導体の形成とデバイス応用

Hiroshi FUJIOKA, Kohei UENO, Atsushi KOBAYASHI, Jitsuo OHTA
Oyobuturi  
doi:10.11470/oubutsu.86.7_576 fatcat:k2crvmpmxfdxna6bp25zo2qx64