Numerical Modeling of Floating Electrodes in a Plasma Processing System

Junghoon Joo
2015 Applied Science and Convergence Technology  
Fluid model based numerical analysis is done to simulate a plasma processing system with electrodes at floating potential. V f is a function of electron temperature, electron mass and ion mass. Commercial plasma fluid simulation softwares do not provide options for floating electrode boundary value condition. We developed a user subroutine in CFD−ACE+ and compared four different cases: grounded, dielectric, zero normal electric field and floating electric potential for a 2D−CCP (capacitively
more » ... CP (capacitively coupled plasma) with a ring electrode.
doi:10.5757/asct.2015.24.4.102 fatcat:jpdn7co3cvbshle2wkv2smaw7u