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Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography
2001
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
The feasibility of utilizing a bottom antireflective coating ͑BARC͒ layer composed of hexamethyldisiloxane ͑HMDSO͒ film for 157 nm lithography is studied. The vaporized liquid HMDSO is used as a coating material in a conventional electron cyclotron resonance-plasma enhanced chemical vapor deposition process. The required optical constants of suitable HMDSO films can easily be tuned by adjusting the gas flow rate ratio of O 2 to HMDSO. The swing effect is experimentally shown to be reduced
doi:10.1116/1.1417549
fatcat:ri2k54kqcvdkxjv2eoacbnyxya