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Conventional plasma nitriding is highly widespread in the industry, but it has essential problems such as edge effect and hollow cathode effect. These problems induced the development of active screen plasma nitriding (ASPN) where the plasma forms on the active screen instead of the sample, which is completely insulated. However, this arrangement does not work with large furnaces, so the usage of bias voltage is necessary in industrial circumstances. In this experiment, the effects of differentdoi:10.1088/1757-899x/426/1/012027 fatcat:klwnxorzw5gszl75ctzhdb6fnm