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A two step process has been developed for the fabrication of diffraction limited concave microlens arrays. The process is based on the photoresist filling of melted holes obtained by a preliminary photolithography step. The quality of these microlenses has been tested in a Mach-Zehnder interferometer. The method allows the fabrication of concave microlens arrays with diffraction limited optical performance. Concave microlenses with diameters ranging between 30 µm to 230 µm and numericaldoi:10.1364/oe.16.019541 pmid:19030040 fatcat:ytk34ep4ljfezbq4ucvimpqyve